The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Jul. 22, 2015
Lam Research Corporation, Fremont, CA (US);
Karl Leeser, Lake Oswego, OR (US);
Saangrut Sangplung, Sherwood, OR (US);
Shankar Swaminathan, Beaverton, OR (US);
Frank Pasquale, Tualiatin, OR (US);
Chloe Baldasseroni, Portland, OR (US);
Ted Minshall, Sherwood, OR (US);
Adrien LaVoie, Newberg, OR (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A gas delivery system for a substrate processing system includes first and second valves, a first gas channel, and a cylinder. The first valve includes a first inlet and a first outlet. The first outlet is in fluid communication with a processing chamber of the substrate processing system. The second valve includes a second inlet and a second outlet. The cylinder defines a second gas channel having a first end and a second end. The cylinder is at least partially disposed within the first gas channel such that the cylinder and the first gas channel collectively define a flow channel. The flow channel is in fluid communication with the first end of the second gas channel and with the first inlet. A third gas channel is in fluid communication with the second end of the second gas channel and with the second inlet.