The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2017

Filed:

Oct. 15, 2014
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Michael S. Bakeman, Union City, CA (US);

Andrei V. Shchegrov, Campbell, CA (US);

Ady Levy, Sunnyvale, CA (US);

Guorong V. Zhuang, San Jose, CA (US);

John J. Hench, Los Gatos, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G01N 23/201 (2006.01); G01N 33/00 (2006.01);
U.S. Cl.
CPC ...
G01N 23/201 (2013.01); G01N 2033/0095 (2013.01);
Abstract

Disclosed are apparatus and methods for performing small angle x-ray scattering metrology. This system includes an x-ray source for generating x-rays and illumination optics for collecting and reflecting or refracting a portion of the generated x-rays towards a particular focus point on a semiconductor sample in the form of a plurality of incident beams at a plurality of different angles of incidence (AOIs). The system further includes a sensor for collecting output x-ray beams that are scattered from the sample in response to the incident beams on the sample at the different AOIs and a controller configured for controlling operation of the x-ray source and illumination optics and receiving the output x-rays beams and generating an image from such output x-rays.


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