The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Oct. 13, 2016
Asml Netherlands B.v., Veldhoven, NL;
Asml Holding N.v., Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Roelof Frederik De Graaf, Veldhoven, NL;
Christiaan Alexander Hoogendam, Westerhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frits Van Der Meulen, Eindhoven, NL;
Franciscus Johannes Herman Maria Teunissen, Rotterdam, NL;
Jan-Gerard Cornelis Van Der Toorn, Eindhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Stefan Philip Christiaan Belfroid, Delft, NL;
Johannes Petrus Maria Smeulers, Zwijndrecht, NL;
Herman Vogel, Sandy Hook, CT (US);
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.