The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2017
Filed:
Nov. 05, 2013
Polishing pad with offset concentric grooving pattern and method for polishing a substrate therewith
Cabot Microelectronics Corporation, Aurora, IL (US);
Ching-Ming Tsai, Aurora, IL (US);
Shi-Wei Cheng, Aurora, IL (US);
Kun-Shu Yang, Aurora, IL (US);
Jia-Cheng Hsu, Aurora, IL (US);
Sheng-Huan Liu, Aurora, IL (US);
Feng-Chih Hsu, Aurora, IL (US);
Craig Kokjohn, Aurora, IL (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The invention provides a polishing pad and a method of using the polishing pad for chemically-mechanically polishing a substrate. The polishing pad comprises a plurality of grooves composed of at least a first plurality of concentric grooves having a first center of concentricity, and a second plurality of concentric grooves having a second center of concentricity. The first center of concentricity is not coincident with the second center of concentricity, the axis of rotation of the polishing pad is not coincident with at least one of the first center of concentricity and the second center of concentricity, the plurality of grooves does not consist of a continuous spiral groove, and the polishing surface does not comprise a mosaic groove pattern.