The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2017
Filed:
Jun. 10, 2014
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Ting-Hau Wu, Yilan, TW;
Chun-Ren Cheng, Hsinchu, TW;
Jiou-Kang Lee, Zhu-Bei, TW;
Jung-Huei Peng, Hsien, TW;
Shang-Ying Tsai, Jhonglie, TW;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04R 31/00 (2006.01); G01C 19/56 (2012.01);
U.S. Cl.
CPC ...
G01C 19/56 (2013.01); Y10T 29/49002 (2015.01);
Abstract
A method of forming a structure for a gyroscope sensor includes forming a first dielectric over a substrate and a material layer over the first dielectric layer. A first portion of the material layer is removed to form a recess and a second portion of the material layer is removed to define a first channel between a gyro disk and a frame. A second channel is formed in the substrate corresponding to the first channel, and a portion of the first dielectric is removed to form a second dielectric between the gyro disk and the substrate.