The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Apr. 11, 2014
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Fred Stanke, San Jose, CA (US);
Ilya Toytman, Menlo Park, CA (US);
David Alles, Los Altos, CA (US);
Gregg Anthony Inderhees, Morgan Hill, CA (US);
Stanley E. Stokowski, Danville, CA (US);
Mehdi Vaez-Iravani, Los Gatos, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2017.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G01N 21/956 (2013.01); G01N 2021/95676 (2013.01); G06K 9/00 (2013.01); G06T 2207/10056 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.