Company Filing History:
Years Active: 2017
Title: Innovations of Gregg Anthony Inderhees
Introduction
Gregg Anthony Inderhees is an accomplished inventor based in Morgan Hill, CA (US). He has made significant contributions to the field of optical inspection methods, particularly in high-resolution photolithography masks. His innovative approach has led to the development of a unique patent that enhances the quality and efficiency of photomask inspection.
Latest Patents
Inderhees holds a patent for "Inspecting high-resolution photolithography masks." This patent focuses on optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions. This innovation represents a significant advancement in the field of photolithography.
Career Highlights
Gregg Inderhees is associated with Kla Tencor Corporation, a leading company in the field of semiconductor manufacturing equipment. His work at Kla Tencor has allowed him to apply his expertise in optical inspection and contribute to the advancement of technology in the industry.
Collaborations
Inderhees has collaborated with notable professionals in his field, including Fred E. Stanke and Ilya Toytman. These collaborations have further enriched his work and contributed to the development of innovative solutions in photolithography.
Conclusion
Gregg Anthony Inderhees is a prominent inventor whose work in optical inspection methods has made a lasting impact on the industry. His patent for inspecting high-resolution photolithography masks showcases his innovative spirit and dedication to advancing technology.