The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Jun. 03, 2016
Applicant:

Freescale Semiconductor, Inc., Austin, TX (US);

Inventors:

Lakshminarayan Viswanathan, Phoenix, AZ (US);

Bruce M. Green, Gilbert, AZ (US);

Darrell G. Hill, Chandler, AZ (US);

L. M. Mahalingam, Scottsdale, AZ (US);

Assignee:

NXP USA, INC., Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/102 (2006.01); H01L 29/417 (2006.01); H01L 23/367 (2006.01); H01L 21/762 (2006.01); H01L 21/3205 (2006.01); H01L 21/04 (2006.01); H01L 21/28 (2006.01); H01L 29/778 (2006.01); H01L 29/66 (2006.01); H01L 29/20 (2006.01); H01L 23/48 (2006.01); H01L 23/373 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4175 (2013.01); H01L 21/042 (2013.01); H01L 21/0475 (2013.01); H01L 21/28 (2013.01); H01L 21/32051 (2013.01); H01L 21/762 (2013.01); H01L 23/367 (2013.01); H01L 23/3677 (2013.01); H01L 23/373 (2013.01); H01L 23/481 (2013.01); H01L 29/2003 (2013.01); H01L 29/66462 (2013.01); H01L 29/7786 (2013.01); H01L 2924/0002 (2013.01);
Abstract

An embodiment of a semiconductor device includes a semiconductor substrate that includes a host substrate and an upper surface, an active area, a substrate opening in the semiconductor substrate that is partially defined by a recessed surface, and a thermally conductive layer disposed over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate within the active area. A method for fabricating the semiconductor device includes defining an active area, forming a gate electrode over a channel in the active area, forming a source electrode and a drain electrode in the active area on opposite sides of the gate electrode, etching a substrate opening in the semiconductor substrate that is partially defined by the recessed surface, and depositing a thermally conductive layer over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate over the channel.


Find Patent Forward Citations

Loading…