The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Jun. 19, 2012
Kunihiko Suzuki, Shizuoka, JP;
Hideki Ito, Kanagawa, JP;
Naohisa Ikeya, Kanagawa, JP;
Hidekazu Tsuchida, Kanagawa, JP;
Isaho Kamata, Tokyo, JP;
Masahiko Ito, Kanagawa, JP;
Masami Naito, Aichi, JP;
Hiroaki Fujibayashi, Kanagawa, JP;
Ayumu Adachi, Aichi, JP;
Koichi Nishikawa, Aichi, JP;
Kunihiko Suzuki, Shizuoka, JP;
Hideki Ito, Kanagawa, JP;
Naohisa Ikeya, Kanagawa, JP;
Hidekazu Tsuchida, Kanagawa, JP;
Isaho Kamata, Tokyo, JP;
Masahiko Ito, Kanagawa, JP;
Masami Naito, Aichi, JP;
Hiroaki Fujibayashi, Kanagawa, JP;
Ayumu Adachi, Aichi, JP;
Koichi Nishikawa, Aichi, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Central Research Institute of Electric Power Industry, Tokyo, JP;
Denso Corporation, Kariya-shi, JP;
Toyota Jidosha Kabushiki Kaisha, Toyota-shi, JP;
Abstract
A film-forming apparatus and method comprising a film-forming chamber for supplying a reaction gas into, a cylindrical shaped liner provided between an inner wall of the film-forming chamber and a space for performing a film-forming process, a main-heater for heating a substrate placed inside the liner, from the bottom side, a sub-heater cluster provided between the liner and the inner wall, for heating the substrate from the top side, wherein the main-heater and the sub-heater cluster are resistive heaters, wherein the sub-heater cluster has a first sub-heater provided at the closest position to the substrate, and a second sub-heater provided above the first sub-heater, wherein the first sub-heater heats the substrate in combination with the main-heater, the second sub-heater heats the liner at a lower output than the first sub-heater, wherein each temperature of the main-heater, the first sub-heater, and the second sub-heater is individually controlled.