The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Oct. 29, 2015
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Choong-Bong Lee, Westborough, MA (US);
Stefan J. Caporale, Marlborough, MA (US);
Jason A. DeSisto, Bellingham, MA (US);
Jong Keun Park, Shrewsbury, MA (US);
Cong Liu, Shrewsbury, MA (US);
Cheng-Bai Xu, Southborough, MA (US);
Cecily Andes, Newton, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
Photoresist overcoat compositions are provided. The compositions comprise: a matrix polymer, an additive polymer a basic quencher and an organic solvent. The additive polymer has a lower surface energy than a surface energy of the matrix polymer, and the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition. The compositions have particular applicability in the semiconductor manufacturing industry for use in negative tone development processes.