The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Nov. 29, 2011
Joeri Lof, Eindhoven, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, s-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor DE Smit, Eindhoven, NL;
Arie Jeffrey Maria Den Boef, Waalre, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, s-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Mark Kroon, Utrecht, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
Joeri Lof, Eindhoven, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, s-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor De Smit, Eindhoven, NL;
Arie Jeffrey Maria Den Boef, Waalre, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, s-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Mark Kroon, Utrecht, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.