The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2016

Filed:

Jan. 15, 2015
Applicant:

Uwiz Technology Co., Ltd., Zhongli, TW;

Inventors:

Yun Lung Ho, Zhongli, TW;

Chun Chieh Lee, Zhongli, TW;

Song Yuan Chang, Zhongli, TW;

Ming Hui Lu, Zhongli, TW;

Ming Che Ho, Zhongli, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/00 (2006.01); C09G 1/02 (2006.01); H01L 21/321 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09G 1/00 (2013.01); H01L 21/3212 (2013.01); H01L 21/3213 (2013.01);
Abstract

A polishing composition comprising abrasive particles, a compound having hexavalent molybdenum or pentavalent vanadium, an anionic additive, a halogen oxides compound or salts thereof, and a carrier solvent is provided herein. The polishing composition is suitable for chemical mechanical polishing process of SiGe, Si and SiOsubstrates. The compound having hexavalent molybdenum or pentavalent can effectively raise the removal rate for SiGe and Si substrates, and increase the polishing selectivity of SiGe and Si relative to SiO, simultaneously.


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