Ming Che Ho

Title: Innovations by Inventor Ming Che Ho

Introduction

Ming Che Ho is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, holding two patents that enhance the performance and quality of polishing processes.

Latest Patents

Ming Che Ho's latest patents include a chemical mechanical polishing slurry designed for polishing stainless steel substrates. This innovative slurry comprises 10-50 wt % of abrasive particles, 0.001-2.0 wt % of a coolant, 0.001-1.0 wt % of an oxidant, 10-5000 ppm of a lubricity improver, and 10-5000 ppm of a foam inhibitor. The particle size of the abrasive particles ranges from 20-500 nm. This alkaline polishing slurry significantly improves polishing performance, surface quality, and surface passivation after the chemical-mechanical polishing process. Another patent involves a polishing composition that includes abrasive particles, a compound with hexavalent molybdenum or pentavalent vanadium, an anionic additive, and a carrier solvent. This composition is particularly effective for the chemical mechanical polishing of SiGe, Si, and SiO substrates, enhancing the removal rate and polishing selectivity.

Career Highlights

Ming Che Ho is currently employed at Uwiz Technology Co., Ltd., where he continues to innovate in the field of polishing technologies. His work has been instrumental in advancing the capabilities of chemical mechanical polishing processes.

Collaborations

Ming Che Ho collaborates with talented coworkers, including Ming Hui Lu and Song Yuan Chang, contributing to a dynamic and innovative work environment.

Conclusion

Ming Che Ho's contributions to the field of chemical mechanical polishing through his patents and work at Uwiz Technology Co., Ltd. highlight his role as a significant inventor in this specialized area. His innovations continue to impact the industry positively.