Zhongli, Taiwan

Chun Chieh Lee

This inventor holds 1 USPTO granted patent. Top assignee: Uwiz Technology Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chun Chieh Lee. Retrieved from https://idiyas.com/inventor/chun-chieh-lee-sryue6u6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 5.0

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Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Innovations of Chun Chieh Lee

Introduction

Chun Chieh Lee is a notable inventor based in Zhongli, Taiwan. He has made significant contributions to the field of polishing compositions, particularly in the context of chemical mechanical polishing processes.

Latest Patents

Chun Chieh Lee holds 1 patent for a polishing composition. This innovative composition comprises abrasive particles, a compound having hexavalent molybdenum or pentavalent vanadium, an anionic additive, a halogen oxides compound or salts thereof, and a carrier solvent. The polishing composition is specifically designed for the chemical mechanical polishing process of SiGe, Si, and SiO substrates. The inclusion of hexavalent molybdenum or pentavalent vanadium effectively enhances the removal rate for SiGe and Si substrates while simultaneously increasing the polishing selectivity of SiGe relative to SiO.

Career Highlights

Chun Chieh Lee is associated with Uwiz Technology Co., Ltd., where he continues to develop innovative solutions in the polishing composition domain. His work has been instrumental in advancing the efficiency of polishing processes in semiconductor manufacturing.

Collaborations

Chun Chieh Lee collaborates with talented individuals such as Yun Lung Ho and Song Yuan Chang, contributing to a dynamic and innovative work environment.

Conclusion

Chun Chieh Lee's contributions to polishing compositions highlight his role as a significant inventor in the field. His innovative solutions continue to impact the semiconductor industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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