Zhongli, Taiwan

Yun Lung Ho

This inventor holds 1 USPTO granted patent. Top assignee: Uwiz Technology Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yun Lung Ho. Retrieved from https://idiyas.com/inventor/yun-lung-ho-ieu29871

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 5.0

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Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Yun Lung Ho

Introduction

Yun Lung Ho is a notable inventor based in Zhongli, Taiwan. He has made significant contributions to the field of polishing compositions, particularly in the context of chemical mechanical polishing processes.

Latest Patents

Yun Lung Ho holds a patent for a polishing composition that includes abrasive particles, a compound with hexavalent molybdenum or pentavalent vanadium, an anionic additive, a halogen oxides compound or salts thereof, and a carrier solvent. This innovative composition is designed for the chemical mechanical polishing of SiGe, Si, and SiO substrates. The inclusion of hexavalent molybdenum or pentavalent vanadium effectively enhances the removal rate for SiGe and Si substrates while simultaneously increasing the polishing selectivity of SiGe relative to SiO.

Career Highlights

Yun Lung Ho is associated with Uwiz Technology Co., Ltd., where he continues to develop and refine his innovative polishing compositions. His work has garnered attention for its potential applications in various semiconductor manufacturing processes.

Collaborations

Yun Lung Ho collaborates with talented individuals such as Chun Chieh Lee and Song Yuan Chang, contributing to a dynamic and innovative work environment.

Conclusion

Yun Lung Ho's contributions to polishing compositions highlight his role as a significant inventor in the field. His innovative approaches continue to influence the semiconductor industry and enhance manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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