Location History:
- Zhongli, TW (2016)
- Taoyuan, TW (2017)
Company Filing History:
Years Active: 2016-2017
Title: Innovations by Inventor Ming Hui Lu
Introduction
Ming Hui Lu is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, with a total of two patents to his name. His work focuses on enhancing the performance and quality of polishing processes for various substrates.
Latest Patents
Ming Hui Lu's latest patents include a chemical mechanical polishing slurry designed for polishing stainless steel substrates. This innovative slurry comprises 10-50 wt % of abrasive particles, 0.001-2.0 wt % of a coolant, 0.001-1.0 wt % of an oxidant, 10-5000 ppm of a lubricity improver, and 10-5000 ppm of a foam inhibitor. The particle size of the abrasive particles ranges from 20-500 nm. This alkaline polishing slurry significantly improves polishing performance, surface quality, and surface passivation effects after the chemical-mechanical polishing process. Another patent involves a polishing composition that includes abrasive particles, a compound with hexavalent molybdenum or pentavalent vanadium, an anionic additive, and a carrier solvent. This composition is particularly effective for the chemical mechanical polishing of SiGe, Si, and SiO substrates, enhancing the removal rate and polishing selectivity.
Career Highlights
Ming Hui Lu is currently associated with Uwiz Technology Co., Ltd., where he continues to innovate in the field of polishing technologies. His expertise and inventions have contributed to advancements in the industry, making him a valuable asset to his company.
Collaborations
Ming Hui Lu collaborates with talented coworkers, including Ming Che Ho and Song Yuan Chang. Their combined efforts in research and development have led to significant advancements in polishing technologies.
Conclusion
Ming Hui Lu's contributions to the field of chemical mechanical polishing demonstrate his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to enhancing performance and quality in polishing applications.