IDiyas

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9390909 B1

PDFFull Text
Date of Patent:
Jul. 12, 2016

Filed:

Feb. 28, 2014

Soft landing nanolaminates for advanced patterning

Applicant:

Novellus Systems, Inc., Fremont, CA (US);

Inventors:

Frank L. Pasquale, Tualatin, OR (US);

Shankar Swaminathan, Beaverton, OR (US);

Adrien LaVoie, Newberg, OR (US);

Nader Shamma, Cupertino, CA (US);

Girish Dixit, San Jose, CA (US);

Assignee:

Novellus Systems, Inc., Fremont, CA (US);

Attorney:

Weaver Austin Villeneuve & Sampson, LLP

Primary Examiner:

Brook Kebede

Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/02 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); H01L 21/66 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); C23C 16/345 (2013.01); C23C 16/401 (2013.01); C23C 16/405 (2013.01); C23C 16/4554 (2013.01); C23C 16/45542 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02164 (2013.01); H01L 21/02219 (2013.01); H01L 21/0337 (2013.01); H01L 22/12 (2013.01); H01L 22/20 (2013.01);
Abstract

Methods for depositing nanolaminate protective layers over a core layer to enable deposition of high quality conformal films over the core layer for use in advanced multiple patterning schemes are provided. In certain embodiments, the methods involve depositing a thin silicon oxide or titanium oxide film using plasma-based atomic layer deposition techniques with a low high frequency radio frequency (HFRF) plasma power, followed by depositing a conformal titanium oxide film or spacer with a high HFRF plasma power.

Published as:
US2015126042A1; KR20150053253A; JP2015111668A; CN104752199A; TW201534556A; US9390909B2; US2016293418A1; US9905423B2; US2018158683A1; TWI640469B; TW201840463A; US10192742B2; TWI675797B; CN111501013A; KR102407002B1; KR20220082792A; KR102551503B1;

Find Patent Forward Citations

Loading…