The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Jul. 21, 2014
Kla-tencor Corporation, Milpitas, CA (US);
Christian Wolters, San Jose, CA (US);
Aleksey Petrenko, Milpitas, CA (US);
Kurt L. Haller, Pleasanton, CA (US);
Juergen Reich, Campbell, CA (US);
Zhiwei Xu, Sunnyvale, CA (US);
Stephen Biellak, Sunnyvale, CA (US);
George Kren, Los Alto Hills, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
The disclosure is directed to a system and method of managing illumination energy applied to illuminated portions of a scanned wafer to mitigate illumination-induced damage without unnecessarily compromising SNR of an inspection system. The wafer may be rotated at a selected spin frequency for scanning wafer defects utilizing the inspection system. Illumination energy may be varied over at least one scanned region of the wafer as a function of radial distance of an illuminated portion from the center of the wafer and the selected spin frequency of the wafer. Illumination energy may be further applied constantly over one or more scanned regions of the wafer beyond a selected distance from the center of the wafer.