The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Jul. 29, 2011
Joeri Lof, Eindhoven, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor DE Smit, Eindhoven, NL;
Arie Jeffrey Maria Den Boef, Waalre, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Aleksey Yurievich Kolensnychenko, Helmond, NL;
Mark Kroon, Utrecht, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
Joeri Lof, Eindhoven, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor De Smit, Eindhoven, NL;
Arie Jeffrey Maria Den Boef, Waalre, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Aleksey Yurievich Kolensnychenko, Helmond, NL;
Mark Kroon, Utrecht, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.