The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Apr. 17, 2014
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Stefan Xalter, Oberkochen, DE;
Yim-Bun Patrick Kwan, Aalen, DE;
Andras G. Major, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Johannes Eisenmenger, Ulm, DE;
Damian Fiolka, Oberkochen, DE;
Jan Horn, Munich, DE;
Markus Deguenther, Aalen, DE;
Florian Bach, Oberkochen, DE;
Michael Patra, Oberkochen, DE;
Johannes Wangler, Koenigsbronn, DE;
Michael Layh, Altusried, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.