The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Apr. 27, 2011
Se-hyuk Im, Austin, TX (US);
Mahadevan Ganapathisubramanian, Cedar Park, TX (US);
Edward Brian Fletcher, Austin, TX (US);
Niyaz Khusnatdinov, Round Rock, TX (US);
Gerard M. Schmid, Austin, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Anshuman Cherala, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Byung-jin Choi, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Se-Hyuk Im, Austin, TX (US);
Mahadevan GanapathiSubramanian, Cedar Park, TX (US);
Edward Brian Fletcher, Austin, TX (US);
Niyaz Khusnatdinov, Round Rock, TX (US);
Gerard M. Schmid, Austin, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Anshuman Cherala, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Byung-Jin Choi, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Canon Nanotechnologies, Inc., Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
Control of lateral strain and lateral strain ratio (d/d) between template and substrate through the selection of template and/or substrate thicknesses (Tand/or T), control of template and/or substrate back pressure (Pand/or P), and/or selection of material stiffness are described.