The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Sep. 28, 2012
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Emad Aqad, Northborough, MA (US);
Cheng-Bai Xu, Southborough, MA (US);
Mingqi Li, Shrewsbury, MA (US);
Shintaro Yamada, Shrewsbury, MA (US);
William Williams, III, Ipswich, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
A photoacid generator compound has the formula (I):[A-(CHR)]-(L)-(CH)—(C(R))—SOZ  (I)wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic Cor greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, Ris H, a single bond, or a substituted or unsubstituted Calkyl group, wherein when Ris a single bond, Ris covalently bonded to a carbon atom of A, each Ris independently H, F, or Cfluoroalkyl, wherein at least one Ris not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a Csulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10,k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.