The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Jan. 23, 2012
Giovanni Bianucci, Vimercate, IT;
Fabio Zocchi, Samarate, IT;
Robert Banham, Woodbridge, GB;
Marco Pedrali, Bergamo, IT;
Boris Grek, Hayward, CA (US);
Natale Ceglio, Pleasanton, CA (US);
Dean Shough, Newark, CA (US);
Gordon Yue, Sunnyvale, CA (US);
Daniel Stearns, Los Altos, CA (US);
Richard A. Levesque, Livermore, CA (US);
Giuseppe Valsecchi, Oggiono Lecco, IT;
Giovanni Bianucci, Vimercate, IT;
Fabio Zocchi, Samarate, IT;
Robert Banham, Woodbridge, GB;
Marco Pedrali, Bergamo, IT;
Boris Grek, Hayward, CA (US);
Natale Ceglio, Pleasanton, CA (US);
Dean Shough, Newark, CA (US);
Gordon Yue, Sunnyvale, CA (US);
Daniel Stearns, Los Altos, CA (US);
Richard A. Levesque, Livermore, CA (US);
Giuseppe Valsecchi, Oggiono Lecco, IT;
Media Lario S.R.L., Bosisio Parini (LC), IT;
Abstract
Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.