Richard Levesque

Title: Richard Levesque: Innovator in EUV Lithography

Introduction

Richard Levesque is a prominent inventor based in Livermore, CA (US). He has made significant contributions to the field of EUV lithography, holding a total of 5 patents. His work focuses on advanced systems that enhance the efficiency and effectiveness of lithography processes.

Latest Patents

One of his latest patents is the "Sn vapor EUV LLP source system for EUV lithography." This innovative system generates a Sn vapor column from a supply of Sn liquid, achieving a Sn-atom density of less than 10 atoms/cm and traveling at or near sonic speeds. The system includes a Sn vapor condenser that recycles Sn liquid and utilizes a pulse laser to create an under-dense Sn plasma, which emits EUV radiation.

Another notable patent is for "Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography." This patent describes a thermal management assembly that includes a GIC mirror shell and a jacket forming a sealed chamber. The assembly employs an open cell, heat transfer material to facilitate cooling, ensuring optimal performance in EUV lithography applications.

Career Highlights

Richard Levesque is currently employed at Media Lario S.r.l., where he continues to innovate in the field of lithography. His expertise and inventions have positioned him as a key figure in advancing EUV technology.

Collaborations

He has collaborated with notable coworkers such as Natale Ceglio and Fabio E Zocchi, contributing to the development of cutting-edge technologies in their field.

Conclusion

Richard Levesque's contributions to EUV lithography through his patents and collaborations highlight his role as a leading inventor in this specialized area. His work continues to influence advancements in lithography technology.