Company Filing History:
Years Active: 2012-2014
Title: Marco Pedrali: Innovator in Thermal Management for EUV Lithography
Introduction: Marco Pedrali, an accomplished inventor based in Bergamo, Italy, stands out in the field of thermal management systems for extreme ultraviolet (EUV) lithography. With two patents to his name, Pedrali's work is integral to advancing technologies used in the semiconductor industry.
Latest Patents: Marco Pedrali's recent contributions to the field include two innovative patents:
1. **Thermal management systems, assemblies, and methods for grazing incidence collectors for EUV lithography**: This patent details a comprehensive GIC thermal management assembly. It includes a GIC mirror shell interfaced with a jacket to create a sealed chamber. Within this metal chamber, an open cell, heat transfer (OCHT) material is thermally and mechanically bonded with the GIC mirror shell and jacket. The design allows a coolant to flow in an azimuthally symmetric manner through the OCHT material, facilitating effective cooling during EUV lithography applications.
2. **Cooling systems and methods for grazing incidence EUV lithography collectors**: This cooling system for a GIC mirror assembly features multiple, circularly arranged cooling lines that operate in parallel planes perpendicular to the shell's central axis. These cooling lines are in thermal contact with the back surface of the shell. The system employs input and output secondary cooling-fluid manifolds to manage the flow of a cooling fluid, strategically designed to minimize thermal gradients that could affect the collector’s performance.
Career Highlights: Marco Pedrali has made significant impacts in his industry, working at Media Lario S.r.l., where he applies his expertise to enhance the efficiency and performance of EUV lithography systems. His inventions have contributed not only to technological advancements but also to the potential for increased productivity in semiconductor manufacturing processes.
Collaborations: Throughout his career, Pedrali has worked alongside talented professionals such as Riccardo Ghislanzoni and Giovanni Bianucci. These collaborations have fostered a dynamic environment conducive to innovation and creativity, propelling the development of cutting-edge thermal management solutions.
Conclusion: Marco Pedrali is a notable inventor contributing to the evolving landscape of EUV lithography. His patents reflect a deep understanding of thermal dynamics and practical applications within the semiconductor industry. As technologies continue to advance, Pedrali's work will undoubtedly influence future innovations in lithography and beyond.