Media Lario S.r.l.

Marco Pedrali

Daniel G Stearns

Boris Grek

Natale Ceglio

Fabio E Zocchi

Robert David Banham

Giuseppe Valsecchi

Richard Levesque

Gordon Yue

Giovanni Bianucci

Riccardo Ghislanzoni

Dean Shough

Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.

Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography

A cooling system () for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly () having at least one shell () with a back surface () is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines () arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface. Input and output secondary cooling-fluid manifolds () are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Cooling systems and methods for grazing incidence EUV lightography collectors

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Bergamo, Italy

Marco Pedrali