Fabio E Zocchi

Title: Innovator Fabio E. Zocchi: Advancing EUV Lithography Technology

Introduction

Fabio E. Zocchi, an accomplished inventor based in Parini, Italy, has made significant contributions to the field of extreme ultraviolet (EUV) lithography. With a total of 11 patents to his name, Zocchi has established himself as a leading figure in developing innovative technologies that enhance lithography systems.

Latest Patents

Zocchi's recent patents demonstrate his expertise and forward-thinking approach. One notable invention is the "Source-collector module with GIC mirror and LPP EUV light source." This innovative module is designed for EUV lithography systems, integrating a laser-produced plasma (LPP) that generates EUV radiation along with a grazing-incidence collector (GIC) mirror. The design features an LPP target system, where a pulsed laser beam is directed through the GIC to strike a solid, movable LPP target. The GIC mirror is finely arranged to capture and focus the emitted EUV radiation, enhancing imaging performance through polynomial surface-figure correction.

Another significant patent by Zocchi involves "Source-collector modules for EUV lithography employing a GIC mirror and a LPP source." This invention reveals a system where radiation is produced from an under-dense plasma, irradiated with infrared radiation to create an EUV-emitting plasma. The design also includes mitigation devices to protect the operational longevity of the source-collector modules.

Career Highlights

Fabio E. Zocchi's career is marked by a commitment to innovation within the lithography field. Working at Media Lario S.r.l., he has played a crucial role in developing technologies challenging the existing limits of EUV lithography. His technical insights and problem-solving capabilities have led to several groundbreaking patents that are paving the way for advancements in semiconductor manufacturing.

Collaborations

Zocchi's work is often complemented by collaboration with esteemed colleagues in his field. Notably, Natale Ceglio and Giovanni Nocerino have worked alongside him, contributing their expertise to enhance the innovative projects they share. Their collaboration has resulted in a synergy that fosters the development of advanced technological solutions.

Conclusion

Fabio E. Zocchi's contributions to EUV lithography technologies are revolutionary. With a distinct focus on improving source-collector modules and advancing the efficiency of radiation generation, Zocchi continues to impact the industry profoundly. As he pioneers new innovations alongside his talented colleagues, the future of lithography systems looks exceedingly promising.