The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Feb. 07, 2013
Media Lario, S.r.l., Bosisio Parini, IT;
Natale M. Ceglio, Pleasanton, CA (US);
Daniel Stearns, Los Altos Hills, CA (US);
Jacques Kools, Simiane Collongue, FR;
Giuseppe Valsecchi, Oggiono, IT;
Fabio Zocchi, Samarate, IT;
Riccardo Binda, Erba, IT;
Media Lario S.R.L., Bosisio Parini (LC), IT;
Abstract
Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.