Riccardo Binda

Title: Riccardo Binda: Innovator in EUV Lithography

Introduction

Riccardo Binda is a notable inventor based in Erba, Italy. He has made significant contributions to the field of EUV lithography, particularly through his innovative patent work. His expertise and dedication to advancing technology have positioned him as a key figure in his industry.

Latest Patents

Riccardo Binda holds a patent for "Source-collector modules for EUV lithography employing a GIC mirror and a LPP source." This patent describes source-collector modules designed for use with EUV lithography systems. The modules utilize a laser-produced plasma EUV radiation source and a grazing-incidence collector. The process involves forming an under-dense plasma and then irradiating it with infrared radiation to create a final EUV-emitting plasma. The design includes features to prevent infrared radiation from reaching the intermediate focus, ensuring efficient operation. Additionally, debris mitigation devices are incorporated to enhance the longevity of the source-collector modules.

Career Highlights

Riccardo Binda has been instrumental in the development of advanced lithography technologies. His work at Media Lario S.r.l. has allowed him to collaborate with other talented professionals in the field. His innovative approach and technical knowledge have led to the successful implementation of his patented technologies.

Collaborations

Riccardo has worked alongside notable colleagues such as Natale Ceglio and Daniel G Stearns. Their combined expertise has contributed to the advancement of EUV lithography technologies.

Conclusion

Riccardo Binda's contributions to EUV lithography through his patent and collaborative efforts highlight his importance in the field. His innovative work continues to influence the development of advanced lithography systems.