Simiane Collongue, France

Jacques Kools


Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Simane-Collongue, FR (2012)
  • Simiane-Collongue, FR (2011 - 2014)
  • Simane, FR (2014)

Company Filing History:


Years Active: 2011-2014

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Jacques Kools: Innovator in EUV Lithography

Introduction

Jacques Kools is a prominent inventor based in Simiane Collongue, France. He has made significant contributions to the field of EUV lithography, holding a total of 4 patents. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of lithography systems.

Latest Patents

Kools' latest patents include innovative designs for source-collector modules used in EUV lithography. One notable patent describes source-collector modules that employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. This technology involves forming an under-dense plasma and irradiating it with infrared radiation to create a final EUV-emitting plasma. Additionally, the grazing incidence collector is designed to prevent infrared radiation from reaching the intermediate focus, while debris mitigation devices are incorporated to extend the operational longevity of the modules.

Another significant patent is for an EUV mirror module featuring a nickel electroformed curved mirror. This module consists of a substrate with a curved upper surface and a self-adjusting bonding material that conforms to fill the space between the substrate and the electroformed mirror. The substrate is also designed with cooling channels to maintain optimal temperatures for the mirror module.

Career Highlights

Jacques Kools is currently employed at Media Lario S.r.l., where he continues to push the boundaries of innovation in lithography technology. His expertise and dedication to research have positioned him as a key figure in the industry.

Collaborations

Kools has collaborated with notable colleagues, including Fabio E Zocchi and Natale Ceglio, contributing to various projects that advance the field of EUV lithography.

Conclusion

Jacques Kools is a distinguished inventor whose work in EUV lithography has led to several important patents. His innovative approaches and collaborations continue to shape the future of lithography technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…