Media Lario S.r.l.

Jacques Kools

Fabio E Zocchi

Daniel G Stearns

Natale Ceglio

Giuseppe Valsecchi

Riccardo Ghislanzoni

Riccardo Binda

Giorgio Pirovano

Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.

Source-collector modules for EUV lithography employing a GIC mirror and a LPP source

An EUV mirror module is disclosed that comprises a substrate with a curved upper surface and a curved electroformed mirror. A self-adjusting bonding material is disposed between the substrate and the electroformed mirror. The bonding material is flowable at a melting temperature and self-adjusts to conformally fill the region between substrate to the electroformed mirror and bond the substrate and the electroformed mirror. The substrate may have at least one cooling channel for cooling the mirror module.

EUV mirror module with a nickel electroformed curved mirror

An adjustable clip for securing a grazing-incident collector (GIC) shell to a spider having spokes is disclosed. The clip includes a base adapted to be secured to a spider spoke and having an upper surface. The clip includes a fork member having two prongs each with end pads at respective prong ends, and having a first hinge portion at an end opposite the prong ends. A hinge leaf is secured to the base upper surface and has a second hinge portion that operably engages the first hinge portion, thereby forming a hinge that allows for rotatable adjustment of the fork member relative to the base. Movement of the GIC shell when performing optical alignment is accommodated by the clip self-adjusting by its end pads moving over the GIC shell outer surface. When GIC shell alignment is achieved, the end pads are secured to the GIC shell outer surface, thereby turning the clip into a rigid support member that secures the GIC shell in place relative to the spider.

Adjustable clips for grazing-incidence collectors

A zone-optimized mirror (MZ) for reflecting extreme ultraviolet (EUV) or X-ray radiation () includes a reflective surface (S) having two or more substantially discrete zones (Z, Z, . . . Zn) that include respective coatings (C, C, . . . Cn). Each coating is configured to optimally reflect a select range of incident angles of the radiation incident thereon. An EUV optical system () and an EUV lithography system () that includes at least one zone-optimized mirror are also disclosed.

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Simiane Collongue, France

Jacques Kools