The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2011
Filed:
May. 05, 2009
Applicants:
Fabio Zocchi, Samarate (VA), IT;
Jacques Kools, Simiane-Collongue, FR;
Inventors:
Fabio Zocchi, Samarate (VA), IT;
Jacques Kools, Simiane-Collongue, FR;
Assignee:
Media Lario, S.r.L., Bosisio Parini, IT;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
A zone-optimized mirror (MZ) for reflecting extreme ultraviolet (EUV) or X-ray radiation () includes a reflective surface (S) having two or more substantially discrete zones (Z, Z, . . . Zn) that include respective coatings (C, C, . . . Cn). Each coating is configured to optimally reflect a select range of incident angles of the radiation incident thereon. An EUV optical system () and an EUV lithography system () that includes at least one zone-optimized mirror are also disclosed.