The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Apr. 07, 2011
Bob Streefkerk, Tilburg, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Joeri Lof, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frits Van Der Meulen, Breda, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Gerardus Petrus Mattijs Van Nunen, Berghem, NL;
Klaus Simon, Eindhoven, NL;
Bernardus Antonius Slaghekke, Veldhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Jan-gerard Cornelis Van Der Toorn, Eindhoven, NL;
Martijn Houkes, Sittard, NL;
Bob Streefkerk, Tilburg, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Joeri Lof, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frits Van Der Meulen, Breda, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Gerardus Petrus Mattijs Van Nunen, Berghem, NL;
Klaus Simon, Eindhoven, NL;
Bernardus Antonius Slaghekke, Veldhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Jan-Gerard Cornelis Van Der Toorn, Eindhoven, NL;
Martijn Houkes, Sittard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.