The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Dec. 09, 2010
Hitoshi Kato, Iwate, JP;
Manabu Honma, Iwate, JP;
Kohichi Orito, Iwate, JP;
Yasushi Takeuchi, Iwate, JP;
Hiroyuki Kikuchi, Iwate, JP;
Hitoshi Kato, Iwate, JP;
Manabu Honma, Iwate, JP;
Kohichi Orito, Iwate, JP;
Yasushi Takeuchi, Iwate, JP;
Hiroyuki Kikuchi, Iwate, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A film deposition apparatus includes a turntable provided in the chamber and having on a first surface a substrate receiving area in which a substrate is placed; first and second reaction gas supplying portions supplying first and second reaction gases to the first surface, respectively; a separation gas supplying portion provided between the first reaction gas supplying portion and the second reaction gas supplying portion and supplying a separation gas that separates the first reaction gas and the second reaction gas; an evacuation port that evacuates the chamber; a space defining member provided for at least one of the first and second reaction gas supplying portions and defining a first space between the at least one of the first and second reaction gas supplying portions and the turntable and a second space so that the separation gas is likely to flow through the second space rather than the first space.