Kohichi Orito

Title: Kohichi Orito: Innovator in Semiconductor Film Formation

Introduction

Kohichi Orito, based in Iwate, Japan, is a remarkable inventor known for his contributions to semiconductor processing. With a total of five patents to his name, he plays a vital role in advancing technology in his field.

Latest Patents

Among his latest inventions is a film formation method and apparatus specifically designed for semiconductor processes. This innovative method entails a cycle of sequentially supplying two kinds of reactive gases within a vacuum container to efficiently form a thin film on a substrate. The process includes placing the substrate, which has a depressed portion, on a table, adjusting its temperature for optimal gas adsorption, and depositing condensed substances through controlled supply cycles. Moreover, he has developed a film deposition apparatus and method, which facilitates the deposition of films on a substrate by executing cycles that systematically introduce source gases. This invention also includes a computer-readable storage medium, adept at guiding the apparatus through the film deposition process.

Career Highlights

Kohichi Orito is employed at Tokyo Electron Limited, a prominent company in the semiconductor manufacturing industry. His work has significantly contributed to the advancement of film deposition technologies, making his patents crucial to the performance of modern semiconductor devices.

Collaborations

Throughout his career, Orito has collaborated with esteemed colleagues, including Hitoshi Kato and Manabu Honma. These partnerships enhance the innovative processes and broaden the scope of research within their field.

Conclusion

Kohichi Orito stands out as an influential inventor whose patents in the semiconductor realm demonstrate his dedication to advancing technology. His innovative methods and collaborations reflect a commitment to excellence that not only benefits his company but also the broader technological landscape.