The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Mar. 15, 2010
Nagarajan Rajagopalan, Santa Clara, CA (US);
Xinhai Han, Sunnyvale, CA (US);
Ryan Yamase, Santa Clara, CA (US);
Ji AE Park, Santa Clara, CA (US);
Shamik Patel, Redlands, CA (US);
Thomas Nowak, Cupertino, CA (US);
Zhengjiang “david” Cui, San Jose, CA (US);
Mehul Naik, San Jose, CA (US);
Heung Lak Park, Santa Clara, CA (US);
Ran Ding, Sunnyvale, CA (US);
Bok Hoen Kim, San Jose, CA (US);
Nagarajan Rajagopalan, Santa Clara, CA (US);
Xinhai Han, Sunnyvale, CA (US);
Ryan Yamase, Santa Clara, CA (US);
Ji Ae Park, Santa Clara, CA (US);
Shamik Patel, Redlands, CA (US);
Thomas Nowak, Cupertino, CA (US);
Zhengjiang “David” Cui, San Jose, CA (US);
Mehul Naik, San Jose, CA (US);
Heung Lak Park, Santa Clara, CA (US);
Ran Ding, Sunnyvale, CA (US);
Bok Hoen Kim, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of forming a passivation layer comprising silicon nitride on features of a substrate is described. In a first stage of the deposition method, a dielectric deposition gas, comprising a silicon-containing gas and a nitrogen-containing gas, is introduced into the process zone and energized to deposit a silicon nitride layer. In a second stage, a treatment gas, having a different composition than that of the dielectric deposition gas, is introduced into the process zone and energized to treat the silicon nitride layer. The first and second stages can be performed a plurality of times.