Ran Ding

Title: The Innovative Contributions of Ran Ding

Introduction

Ran Ding is a distinguished inventor based in Sunnyvale, California, recognized for his innovative contributions to the field of semiconductor technology. With a total of three patents to his name, Ding has made significant strides in advancing manufacturing processes that enhance the efficiency and reliability of electronic components.

Latest Patents

Ding's most recent patents showcase his expertise and focus on developing cutting-edge processes. One of his notable inventions is a method for creating a silicon nitride passivation layer that effectively covers high aspect ratio features on semiconductor substrates. This process involves a two-stage deposition method where a dielectric deposition gas, containing silicon and nitrogen, is first introduced to form the silicon nitride layer. Subsequently, a distinct treatment gas is utilized to refine the properties of the silicon nitride. Notably, these stages can be repeated multiple times to optimize the layer's quality.

Another important patent pertains to the fabrication of through-silicon vias on silicon wafers. This method begins by etching a series of through holes in a silicon plate, followed by depositing an oxide liner that coats the interior surfaces. The process includes the deposition of a metallic conductor within the holes, providing essential electrical connectivity. Additionally, a silicon nitride passivation layer can be applied to the exposed back surface of the silicon plate for enhanced protection.

Career Highlights

Ran Ding works at Applied Materials, Inc., a leading company in the manufacture of equipment for the semiconductor industry. His role involves leveraging his inventive skills to advance technologies that facilitate the production of microelectronic devices. His contributions play a vital role in enhancing the manufacturing processes used to create modern electronics.

Collaborations

Ding collaborates with notable colleagues such as Nagarajan Rajagopalan and Ji Ae Park, both of whom are instrumental in driving projects forward at Applied Materials, Inc. Their combined efforts foster a robust environment of innovation and creativity, aiming to solve complex challenges in the semiconductor manufacturing space.

Conclusion

Ran Ding's work exemplifies the spirit of innovation that fuels advancements in technology. His patents not only reflect his dedication to improving semiconductor processes but also contribute to the industry's evolution. As he continues to work alongside talented professionals, Ding is poised to make even greater impacts on the future of electronics and manufacturing.