The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Sep. 12, 2006
Mari Nozoe, Hino, JP;
Hidetoshi Nishiyama, Kokubunji, JP;
Shigeaki Hijikata, Ome, JP;
Kenji Watanabe, Ome, JP;
Koji Abe, Hitachinaka, JP;
Mari Nozoe, Hino, JP;
Hidetoshi Nishiyama, Kokubunji, JP;
Shigeaki Hijikata, Ome, JP;
Kenji Watanabe, Ome, JP;
Koji Abe, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Hitachi Tokyo Electronics Co., Ltd., Tokyo, JP;
Abstract
An electron beam apparatus equipped with a review function of a semiconductor wafer includes a scanning electron microscope to obtain image information of a semiconductor wafer, and an information processing apparatus to process the image information. The information processing apparatus includes a data input unit to receive positional information of a defect on the wafer, a storage for storing a plurality of image information of a position on the wafer corresponding to the positional information, and an image processing unit that retrieves any of the plurality of image information, and classifies the retrieved image information corresponding to the positional information depending on the type of defect.