The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Feb. 02, 2010
Joeri Lof, Eindhoven, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, s-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor DE Smit, Eindhoven, NL;
Arie Jeffrey Maria Den Boef, Waaire, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, s-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Mark Kroon, Utrecht, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
Joeri Lof, Eindhoven, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, s-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor De Smit, Eindhoven, NL;
Arie Jeffrey Maria Den Boef, Waaire, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, s-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Mark Kroon, Utrecht, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.