The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Sep. 29, 2010
Chung-chi Ko, Nantou, TW;
Chia Cheng Chou, Keelung, TW;
Keng-chu Lin, Ping-Tung, TW;
Joung-wei Liou, Zhudong Town, TW;
Shwang-ming Jeng, Hsinchu, TW;
Mei-ling Chen, Hsinchu County, TW;
Chung-Chi Ko, Nantou, TW;
Chia Cheng Chou, Keelung, TW;
Keng-Chu Lin, Ping-Tung, TW;
Joung-Wei Liou, Zhudong Town, TW;
Shwang-Ming Jeng, Hsinchu, TW;
Mei-Ling Chen, Hsinchu County, TW;
Abstract
A method of and apparatus for forming interconnects on a substrate includes etching patterns in ultra-low k dielectric and removing moisture from the ultra-low k dielectric using active energy assist baking. During active energy assist baking, the ultra-low k dielectric is heated and exposed to light having only wavelengths greater than 400 nm for about 1 to about 20 minutes at a temperature of about 300 to about 400 degrees Celsius. The active energy assist baking is performed after wet-cleaning or after chemical mechanical polishing, or both.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile