The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Jan. 21, 2011
Hung-chun Wang, Ching-Suei, TW;
Jeng-horng Chen, Hsin-Chu, TW;
Shy-jay Lin, Jhudong Township, TW;
Chia-ping Chiang, Taipei, TW;
Cheng Kun Tsai, Hsinchu, TW;
Wen-chun Huang, Xi-Gang Xiang, TW;
Ru-gun Liu, Hsinchu, TW;
Hung-Chun Wang, Ching-Suei, TW;
Jeng-Horng Chen, Hsin-Chu, TW;
Shy-Jay Lin, Jhudong Township, TW;
Chia-Ping Chiang, Taipei, TW;
Cheng Kun Tsai, Hsinchu, TW;
Wen-Chun Huang, Xi-Gang Xiang, TW;
Ru-Gun Liu, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method for writing a design to a material using an electron beam includes assigning a first dosage to a first polygonal shape. The first polygonal shape occupies a first virtual layer and includes a first set of pixels. The method also includes simulating a first write operation using the first polygonal shape to create the design, discerning an error in the simulated first write operation, and assigning a second dosage to a second polygonal shape to reduce the error. The second polygonal shape occupies a second virtual layer. The method further includes creating a data structure that includes the first and second polygonal shapes and saving the data structure to a non-transitory computer-readable medium.