The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8411928 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 02, 2013

Filed:

Jun. 10, 2009
Applicants:

Hideaki Sasazawa, Yokohama, JP;

Takenori Hirose, Yokohama, JP;

Minoru Yoshida, Yokohama, JP;

Keiya Saito, Hiratsuka, JP;

Shigeru Serikawa, Chigasaki, JP;

Inventors:

Hideaki Sasazawa, Yokohama, JP;

Takenori Hirose, Yokohama, JP;

Minoru Yoshida, Yokohama, JP;

Keiya Saito, Hiratsuka, JP;

Shigeru Serikawa, Chigasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.


Find Patent Forward Citations

Sasazawa, Hideaki. (2013). Scatterometry method and device for inspecting patterned medium (U.S. Patent No. 8411928). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8411928

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