The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2013
Filed:
Nov. 07, 2008
Bernhard Gellrich, Aalen, DE;
Jens Kugler, Aalen, DE;
Thomas Ittner, Aalen, DE;
Stefan Hembacher, Bobingen, DE;
Karl-heinz Schimitzek, Oberkochen, DE;
Payam Tayebati, Ulm, DE;
Hubert Holderer, Oberkochen, DE;
Bernhard Gellrich, Aalen, DE;
Jens Kugler, Aalen, DE;
Thomas Ittner, Aalen, DE;
Stefan Hembacher, Bobingen, DE;
Karl-Heinz Schimitzek, Oberkochen, DE;
Payam Tayebati, Ulm, DE;
Hubert Holderer, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.