The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Jul. 21, 2009
Stefan Xalter, Oberkochen, DE;
Yim-bun Patrick Kwan, Aalen, DE;
Andras G. Major, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Johannes Eisenmenger, Ulm, DE;
Damian Fiolka, Oberkochen, DE;
Jan Horn, Ulm, DE;
Markus Deguenther, Aalen, DE;
Florian Bach, Oberkochen, DE;
Michael Patra, Oberkochen, DE;
Johannes Wangler, Koenigsbronn, DE;
Michael Layh, Aalen, DE;
Stefan Xalter, Oberkochen, DE;
Yim-Bun Patrick Kwan, Aalen, DE;
Andras G. Major, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Johannes Eisenmenger, Ulm, DE;
Damian Fiolka, Oberkochen, DE;
Jan Horn, Ulm, DE;
Markus Deguenther, Aalen, DE;
Florian Bach, Oberkochen, DE;
Michael Patra, Oberkochen, DE;
Johannes Wangler, Koenigsbronn, DE;
Michael Layh, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.