The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Oct. 12, 2005
Takehiko Orii, Nirasaki, JP;
Kenji Sekiguchi, Niraskai, JP;
Noritaka Uchida, Koshi, JP;
Satoru Tanaka, Koshi, JP;
Hiroki Ohno, Nirasaki, JP;
Takehiko Orii, Nirasaki, JP;
Kenji Sekiguchi, Niraskai, JP;
Noritaka Uchida, Koshi, JP;
Satoru Tanaka, Koshi, JP;
Hiroki Ohno, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus according to the present invention is provided with a spin chuck () that holds a substrate (W) and rotates the same. A process liquid supply system (, . . . ) is disposed to supply a process liquid to the substrate rotated by the spin chuck. There are disposed a fluid nozzle () that supplies to the substrate a drying fluid having a higher volatility than that of the process liquid, and an inert gas nozzle () that supplies an inert gas to the substrate. A nozzle moving mechanism (, . . . ) is disposed that moves the nozzles () radially outward relative to a rotational center (Po) of the substrate, while maintaining the inert gas nozzle nearer to the rotational center of the substrate than the fluid nozzle.