The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 2012

Filed:

Nov. 05, 2006
Applicants:

Boon Meng Seah, Singapore, SG;

Bei Chao Zhang, Singapore, SG;

Raymond Joy, Singapore, SG;

Shao Beng Law, Singapore, SG;

John Sudijono, Singapore, SG;

Liang Choo Hsia, Singapore, SG;

Inventors:

Boon Meng Seah, Singapore, SG;

Bei Chao Zhang, Singapore, SG;

Raymond Joy, Singapore, SG;

Shao Beng Law, Singapore, SG;

John Sudijono, Singapore, SG;

Liang Choo Hsia, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

An first example method and apparatus for etching and cleaning a substrate comprises device with a first manifold and a second manifold. The first manifold has a plurality of nozzles for dispensing chemicals onto the substrate. The second manifold is attached to a vacuum source and/or a dry air/gas source. A second example embodiment is a wafer cleaning device and method that uses a manifold with capillary jet nozzles and a liquid capillary jet stream to clean substrates.


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