The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Mar. 02, 2006
Masanobu Honda, Nirasaki, JP;
Tetsuji Sato, Nirasaki, JP;
Shin Matsuura, Nirasaki, JP;
Yutaka Matsui, Nirasaki, JP;
Masanobu Honda, Nirasaki, JP;
Tetsuji Sato, Nirasaki, JP;
Shin Matsuura, Nirasaki, JP;
Yutaka Matsui, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing method includes the steps of etching the target object with a CF-based processing gas by using a patterned resist film as a mask, removing deposits accumulated inside a processing chamber during the step of etching the target object by using a processing gas containing at least an Ogas, and ashing the resist film by using a processing gas containing at least an Ogas. Relevant places in the processing chamber from which the deposits are removed are heated in the step of removing the deposits.