The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2012
Filed:
Jul. 07, 2006
Joeri Lof, Eindhoven, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor DE Smit, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Helmar Van Santen, Amsterdam, NL;
Marcus Adrianus Van DE Kerhof, Helmond, NL;
Mark Kroon, Utrecht, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Joeri Lof, Eindhoven, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor De Smit, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Helmar Van Santen, Amsterdam, NL;
Marcus Adrianus Van De Kerhof, Helmond, NL;
Mark Kroon, Utrecht, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.