The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2011
Filed:
Sep. 20, 2010
Chen-yuan Hsia, Hsin-Chu, TW;
Chang-cheng Hung, Jhubei, TW;
Chi-lun LU, Changhua, TW;
Shih-ming Chang, Hsin-Chu, TW;
Wen-chuan Wang, Taipei, TW;
Yen-bin Huang, Tainan, TW;
Ching-yu Chang, Yilang, TW;
Chin-hsiang Lin, Hsin-Chu, TW;
Chen-Yuan Hsia, Hsin-Chu, TW;
Chang-Cheng Hung, Jhubei, TW;
Chi-Lun Lu, Changhua, TW;
Shih-Ming Chang, Hsin-Chu, TW;
Wen-Chuan Wang, Taipei, TW;
Yen-Bin Huang, Tainan, TW;
Ching-Yu Chang, Yilang, TW;
Chin-Hsiang Lin, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A system for semiconductor wafer manufacturing, comprises a chamber process path for processing the wafer, and a device operable to remove particles from the wafer by electrostatic and electromagnetic methodologies wherein the device is installed in the chamber process path.