The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
Dec. 17, 2003
Masayuki Tomoyasu, Yamanashi, JP;
Merritt Lane Funk, Austin, TX (US);
Kevin Augustine Pinto, Austin, TX (US);
Masaya Odagiri, Beverly, MA (US);
Lemuel Chen, Taoyuan, TW;
Asao Yamashita, Wappingers Falls, NY (US);
Akira Iwami, Yamanashi, JP;
Hiroyuki Takahashi, North Andover, MA (US);
Masayuki Tomoyasu, Yamanashi, JP;
Merritt Lane Funk, Austin, TX (US);
Kevin Augustine Pinto, Austin, TX (US);
Masaya Odagiri, Beverly, MA (US);
Lemuel Chen, Taoyuan, TW;
Asao Yamashita, Wappingers Falls, NY (US);
Akira Iwami, Yamanashi, JP;
Hiroyuki Takahashi, North Andover, MA (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A processing system and method for chemical oxide removal (COR) is presented, wherein the processing system comprises a first treatment chamber and a second treatment chamber, wherein the first and second treatment chambers are coupled to one another. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber, and an independently temperature controlled substrate holder for supporting a substrate for chemical treatment. The substrate is exposed to a gaseous chemistry, such as HF/NH, under controlled conditions including surface temperature and gas pressure. The second treatment chamber comprises a heat treatment chamber that provides a temperature controlled chamber, thermally insulated from the chemical treatment chamber. The heat treatment chamber provides a substrate holder for controlling the temperature of the substrate to thermally process the chemically treated surfaces on the substrate.